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© 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.

Abstract

A strategy to determine the effect of Cd2+ on the electrodeposition of copper from a copper electrolyte by cyclone electrowinning is presented. The concentration of Cu2+ in the copper electrolyte with different Cd2+ concentrations was determined by atomic absorption spectrometry (AAS). It indicated that the current efficiency, the rate of electrodeposition, and the rate copper electrodeposition decreased with the addition of Cd2+ in the three stages of electrodeposition. The current efficiency declined from 99.6 to 79.2% and the copper electrodeposition rate declined from 52 to 40% in the first electrodeposition. The current efficiency had no significant change, and the copper electrodeposition rate declined from 88 to 77% in the second electrodeposition. The current efficiency declined from 72.6 to 40.3%, and the copper electrodeposition rate was all at 99% in the third electrodeposition. The influences of the Cd2+ concentration on the purity and morphology of cathode copper were investigated. The effect of Cd2+ concentration on the purity and morphology of cathode copper was also studied. In the three-stage electrodeposition, the addition of the Cd2+ concentration mainly affected the microstructure of the cathode copper, but it had little effect on the purity of the cathode copper. The higher the amount of Cd2+, the rougher the morphology of the cathode copper and the larger the gap between the grains; the higher the amount of Cd2+, the lower the electrodeposition rate and current efficiency, though the reduction was small.

Details

Title
Effect of Cd2+ on Electrodeposition of Copper in Cyclone Electrodeposition
Author
Wang, Yan; Xu, Hongao; Guo, Jihao
First page
529
Publication year
2021
Publication date
2021
Publisher
MDPI AG
e-ISSN
20754701
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2530196622
Copyright
© 2021 by the authors. Licensee MDPI, Basel, Switzerland. This article is an open access article distributed under the terms and conditions of the Creative Commons Attribution (CC BY) license (http://creativecommons.org/licenses/by/4.0/). Notwithstanding the ProQuest Terms and Conditions, you may use this content in accordance with the terms of the License.