Abstract

Structural properties of TiO2 thin films play a main role in determine the characteristic of the thin films especially their stability and activity, the total pressure has a great influence in determine the crystallinity of the films and the orientation of the facets of their structure, especially the two facet (101) and (001), the enhancing the structure properties will cause to enhance the application efficiency of TiO2 thin films such as the dissociative adsorption of water and the solar cell

Details

Title
Structure Characteristics of TiO2 Thin Films Prepared by DC Reactive Magnetron Sputtering at Low Pressure
Author
Ahmed, A S; Kadhim, I H; Ramadhan, A A
Pages
77 - 86
Publication year
2021
Publication date
2021
Publisher
NeuroQuantology
e-ISSN
13035150
Source type
Scholarly Journal
Language of publication
English
ProQuest document ID
2528467103
Copyright
Copyright NeuroQuantology 2021